Pulsed Laser Deposition(PLD) system

Basically,this system is used for ablation of multifunctional oxide materials for its thin film deposition,which is a physical vapor deposition(PVD)technique.Its applied energy density is of maximum 5 J/cm^2.Thin film thickness and its properties can be tuned by Laser pulse energy and frequency,Oxygen Partial pressure,Deposition and Annealing temperature,Target to substrate distance and on substrate property.

List of research areas where it can be useful
Generally, it is used for various types of thin film deposition techniques.